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APPLICATION OF LIQUID TYPE PHOTOIMAGEABLE SOLDER MASK YK2003-710
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(1) One-side exposure
(2) Double-side exposure
Pre-baking
Optimal pre-baking processing condition is 60min. 70¢J
Exposure
Exposure energy of 200~300 mJ/cm2 is required.
Development
Table 1 Development condition
|
Development condition |
Optimal development condition |
Developer |
0.7~1.5wt.%Na2CO3 |
1.0wt.%Na2CO3 |
Temperature |
25~35¢J |
30¢J |
Spray pressure |
98~294 kPa (1.0~3.0 kg/cm2) |
196 kPa (2.0 kg/cm2) |
Development time |
30~90sec. |
60sec. |
Post-curing(Thermosetting)
Optimal post-curing processing condition is 60min. at 150¢J.
ALL DATA FOR REFERENCE ONLY