Photo-Imageable Etching Resist

A ) OUTLINES

 

Micro-Photo-Imageable Etching Resist INK NPR-30BS-2 is a newly developed one component liquid type, alkaline-developing, photo imageable etching ink. NPR-30BS-2 is designed to be replaceable the currently used DRY FILM which has disadvantages of inferior resolution and hard to control operating/storing conditions and etc.

NPR-30BS-2 is enable to make 30 micron line/space, and 50 micron line/space can be made easily in volume production by 30BS-2.

 

B) CHARACTERISTICS

 

a) Marvelous Resolution

30-50 micron line/space can be obtained easily in volume production.

b) Excellent Stability

Long pot life (more than 3 months).

Recommend low temperature storing but use under yellow light in operation.

c) Perfect Developability

Stable developability/resolution can be performed even after 10 days of coating.

 

C) SPECIFICATIONS

 

Terms

Typical Value

Reference

Color; State

Purple; Gel

Visually

Viscosity(25 deg.C)

170¡Ó20ps

VT-4 Viscometer

Thixotropic index

ID No.4.0¡Ó1.0

Brookfield HBT Model

Coating Method

Screen Printing

150 mesh polyester screen

Shelf/Pot life

More than 3 months

25 deg.or lower

Drying Condition

80 deg. C-20 min.

Hot air oven

Exposure Condition

100 mi./sq..cm

365 nm. peak

Developing Condition

1% Na2CO3 solution 30 deg.C

Spray pressure 2 kg/sq..cm

 

Etching Condition

Ferric/Cupric Chloride solution

40 deg.C Spray pressure 2 kg/sq..cm with less than 60 sec.

 

Stripping Condition

3-5% NaOH solution 50 deg.C

with less than 5 min.

 

Specified Thinner

Use solvent#8500

 

 

 

D) DIRECTION TO USE

 

1)       Stir NPR-30BS-2 completely before use.

2)       Use 150 meshes polyester screen with 10 to 20 micron emulsion thickness for coating purposes.

3)       Use specified thinner#8500 for dilution when the viscosity is high in case of wintertime. Addition of thinner #8500 should be less than 3%. 1% of #8500 will cause 10-20 ps drop.

4)       Keep/Store NPR-30BS-2 under 25 deg.C in cool and well ventilated place to avoid direct sun light.

5)       Drying condition might be changed depending on coated film thickness. Establish own process condition before use. The suggested drying condition is 75-80 deg.C,20-30 min.

6)       Recommended developing conditions;

1.0-1.5% of Na2CO3 solution

 

Spray pressure

2 kg/sq..cm.

Solution

30 deg.C

Developing time

60 sec.or up

Rinsing time

60 sec.or up

7) Etching cond.;

Establish own cond..

8) Recommended stripping cond;

3-5% of Na OH solution with 40-50 deg.C

9) Cleaning of tools;

Use Ester/Chloride ¡VHydrocarbon solvent to clean/rinse the tools.

 

E) REFERENCE DATA (PHOTO-SENSITIVITY)

 

Exposure Energy(mj./sq..cm.)

Photo Sensitivity ((Tablet 21)

Resolution (Line/Space)

60 mj.

Step 3

30 micron

80 mj.

Step 4

30 micron

100 mj.

Step 5

30 micron

 

F) TEST DATA OF ALKALINE ETCHING

 

Solution: A process (MELTEX)

PH- 8 to 9

Temperature=48 deg C

Time= 10 min.

Result= PASS

Above test data were taken by under conditions;

Drying condition

80 deg.C.10 min

1% Na 2CO3 solution temp.

30 deg.C

Spray press.

2 kg/sq..cm

Developing time

1 min.

Film thickness

15 micron